Growth of textured ZnO:In thin films by chemical spray deposition

Abstract Insium-dopod zinc thin films were grown using the chemical spray deposition technique and different doping compounds in the solution. The partucular, indium chloride, indium sulfate and indium acetate were used as indium sources. The films show a high degree of preferential crystalline orientation which depends mainly on the type of doping compound and the substrate temperature. The lowest value o the resistivity is 2 × 10 −3 ω cm and and the transmittance is on average higher than 90%. It was found that the texture of the films could be change quite easily making it possible to grow films for different applications.

[1]  H. Nanto,et al.  The stability of aluminium-doped ZnO transparent electrodes fabricated by sputtering , 1986 .

[2]  W. W. Wenas,et al.  Electrical and optical properties of boron‐doped ZnO thin films for solar cells grown by metalorganic chemical vapor deposition , 1991 .

[3]  R. Gordon,et al.  Textured fluorine-doped ZnO films by atmospheric pressure chemical vapor deposition and their use in amorphous silicon solar cells , 1991 .

[4]  NO2 Sensitive Ga-doped ZnO Thin Film , 1992 .

[5]  H. Nanto,et al.  Highly conductive and transparent ZnO thin films prepared by r.f. magnetron sputtering in an applied external d.c. magnetic field , 1985 .

[6]  O. Caporaletti.  Electrical and optical properties of bias sputtered ZnO thin films , 1982 .

[7]  Kenneth Meade Lakin,et al.  Growth of Epitaxial ZnO Thin Films by Organometallic Chemical Vapor Deposition , 1980 .

[8]  A. Banerjee,et al.  Thickness-dependent properties of indium-doped ZnO films , 1986 .

[9]  T. Shiosaki,et al.  Laser-induced MOCVD of ZnO thin films , 1990 .

[10]  I. Hamberg,et al.  Optical properties of sputter-deposited ZnO:Al thin films , 1988 .

[11]  T. Nakada,et al.  Effect of Water Vapor on the Growth of Textured ZnO-Based Films for Solar Cells by DC-Magnetron Sputtering , 1991 .

[12]  N. F. Foster.  Crystallographic Orientation of Zinc Oxide Films Deposited by Triode Sputtering , 1969 .

[13]  W. W. Wenas,et al.  Textured ZnO Thin Films for Solar Cells Grown by Metalorganic Chemical Vapor Deposition , 1991 .

[14]  K. L. Chopra,et al.  Effect of hydrogen plasma treatment on transparent conducting oxides , 1986 .

[15]  A. Fahrenbruch,et al.  Transport mechanisms in ZnO/CdS/CuInSe2 solar cells , 1990 .

[16]  C. Granqvist,et al.  Band-gap widening in heavily Sn-dopedIn2O3 , 1984 .

[17]  J. Rickards,et al.  Nuclear reactions as a probe of fluorine content in SnO2:F thin films , 1991 .

[18]  Kim W. Mitchell,et al.  CuInSe/sub 2/ cells and modules , 1990 .

[19]  J. Gasiot,et al.  A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film , 1976 .

[20]  J. W. Stout,et al.  Magnetostriction of NiF2 , 1966 .

[21]  K. L. Chopra,et al.  Annealing studies of undoped and indium-doped films of zinc oxide , 1984 .

[22]  A. Chernets,et al.  Preparation and properties of thin films of ZnO for hypersonic transducers , 1973 .

[23]  K. L. Chopra,et al.  Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysis☆ , 1983 .

[24]  A. P. Roth,et al.  Band-gap narrowing in heavily defect-doped ZnO , 1982 .