SCA and SPV in line monitoring

In an industrial environment, new techniques based on the surface photovoltage measurement (SCA and SPV), are shown to detect sodium, aluminum, iron contamination in the range of E + 10/cm2. Variations in the measurements due to wafer samples or oxidation recipe are determined. From these results, a procedure for preparing monitoring samples is established. It is demonstrated that these monitoring tools are useful to monitor equipment but a correlation between the defectivity on a 12 nm gate oxide and SCA and SPV results with the same recipes was not obtained.