Takeoff angle‐dependent x‐ray fluorescence of layered materials using a glancing incident x‐ray beam

We had previously shown that takeoff angle‐dependent x‐ray fluorescence (TADXRF) is a useful method for the characterization of thin films. Here we have calculated takeoff angle‐dependence of fluorescent x rays at glancing incidence for multilayer materials. The experimental results of TADXRF for Au/Ni/SiO2 agree well with the calculated curves, suggesting that the calculation process is correct. As a result, the thickness, density, and the refractive index of layers can be estimated.

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