论文信息 - High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes - 字舞流文

High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes

V. Narayanan | J. Bruley | H. Jagannathan | M. Takayanagi | B. Linder | M. Copel | P. Jamison | V. Paruchuri | R. Iijima | L. Edge | G. Leusink | R. Clark | S. Consiglio | C. Wajda | T. Sugawara | H. Nakabayashi