MacroCD contact ellipticity measurement for lithography tool qualification
暂无分享,去创建一个
Peter Vanoppen | Ilan Englard | Eelco van Setten | Ofer Adan | Frank Duray | Liraz Gershtein | Ram Peltinov | Amit Moran | Ingrid Minnaert-Janssen | Gert-Jan Janssen
[1] Ilan Englard,et al. Enhancing yield and productivity with process control applications for contact and via module , 2003, SPIE Advanced Lithography.
[2] Jo Finders,et al. Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination , 2006, SPIE Advanced Lithography.
[3] Ofer Adan,et al. CD SEM metrology macro CD technology: beyond the average , 2005, SPIE Advanced Lithography.