Study of argon/oxygen plasma used for creation of aluminium oxide thin films

The aim of this work was to investigate a low temperature plasma used for plasma oxidation. The experiments were performed in a system for plasma-chemical surface modification of thin films. In our experiments we used a DC discharge or capacitively coupled RF discharge to generate the plasma in various oxygen/argon mixtures. The main diagnostic techniques applied to determine plasma parameters were the optical and probe diagnostics. The combination of the above mentioned diagnostic techniques enabled to evaluate the influence of plasma parameters during plasma oxidation upon the quality of the aluminium oxide films.