论文信息 - Atomic Layer Deposition of Α-Al2o3 from Trimethylaluminum and H2o: Effect of Process Parameters and Plasma Excitation on Structure Development - 字舞流文

Atomic Layer Deposition of Α-Al2o3 from Trimethylaluminum and H2o: Effect of Process Parameters and Plasma Excitation on Structure Development

J. Aarik | R. Talviste | J. Raud | L. Aarik | Carl-Thomas Piller | Indrek Jögi | Carl‐Thomas Piller