A coordinated flowing afterglow and crossed beam study of electron attachment to CCl3Br

[1]  Stampfli,et al.  Vibrationally Resolved Electron Attachment to Oxygen Clusters. , 1996, Physical review letters.

[2]  T. Märk,et al.  DISSOCIATIVE ELECTRON ATTACHMENT TO OZONE USING A HIGH-RESOLUTION CROSSED BEAMS TECHNIQUE , 1996 .

[3]  Š. Matejčík,et al.  The varying influences of gas and electron temperatures on the rates of electron attachment to some selected molecules , 1995 .

[4]  T. Märk,et al.  Formation of SF5− in electron attachment to SF6; swarm and beam results reconciled , 1995 .

[5]  T. Miller,et al.  THERMAL ELECTRON ATTACHMENT TO SF4 AND SF6 , 1994 .

[6]  T. Märk,et al.  Experimental investigation of the electron impact ionization cross-section behaviour near threshold , 1994 .

[7]  P. Španěl,et al.  Electron Temperature Relaxation in Afterglow Plasmas: Diffusion Cooling , 1994 .

[8]  Loucas G. Christophorou,et al.  Linking the Gaseous and Condensed Phases of Matter , 1994 .

[9]  P. Španěl,et al.  FALP studies of electron attachment at elevated electron temperatures: the influence of attachment on electron energy distributions , 1993 .

[10]  T. Märk,et al.  Time-of-flight apparatus for studies of pulsed neutral van-der-Waals-cluster production and of the interaction between electrons and van der Waals clusters at high electron energy resolution , 1993 .

[11]  T. Märk,et al.  Electron attachment to C60 at low energies , 1993 .

[12]  T. Märk,et al.  Free electron attachment to C60 and C70 , 1993 .

[13]  T. Märk,et al.  Production of non-stoichiometric SF6 cluster anions by electron attachment to SF6 clusters , 1993 .

[14]  J. Mitchell,et al.  A further study of HCO+ dissociative recombination , 1992 .

[15]  H. Budzikiewicz,et al.  The composition of the CH4 plasma , 1990 .

[16]  J. Paulson,et al.  Formation of Br−2 in the reactions of thermal electrons with some bromomethanes and bromoethanes , 1990 .

[17]  N. Adams,et al.  Studies of dissociative electron attachment to the free radicals CCl3 and CCl2Br using the FALP apparatus , 1988 .

[18]  Giacinto Scoles,et al.  Atomic and Molecular Beam Methods , 1988 .

[19]  Leiter,et al.  Low-energy-electron attachment to oxygen clusters produced by nozzle expansion. , 1985, Physical review letters.

[20]  N. Adams,et al.  Attachment coefficients for the reactions of electrons with CCl4, CCl3F, CCl2F2, CHCl3, Cl2 and SF6 determined between 200 and 600 K using the FALP technique , 1984 .

[21]  L. Christophorou,et al.  in Electron - Molecule Interactions and their Applications , 1984 .

[22]  N. Adams,et al.  The application of Langmuir probes to the study of flowing afterglow plasmas , 1975 .

[23]  R. C. Weast CRC Handbook of Chemistry and Physics , 1973 .

[24]  G. Schulz,et al.  Characteristics of the Trochoidal Electron Monochromator , 1970 .