Silicon pore optics are currently under development for missions such as the International X-ray Observatory (IXO) as an alternative to the glass or nickel shell mirrors that were used in previous generation X-ray telescopes. The unprecedented effective area requirement of the IXO requires a modular optics design suitable for mass production. In this paper we discuss the current state-of-the-art in plate manufacturing technology. We provide examples of process innovations that have directly impacted the cost per mirror plate and have reduced the manufacturing cost of a mirror module. We show how a switch from silicon to silica as the reflective surface results in a simplified process flow without a corresponding change in the optical performance. We demonstrate how standard photolithographic techniques, applied in the semiconductor industry, can be used to pattern a reflective layer. The 5 arc-second angular resolution requirement of the IXO has stimulated a theoretical analysis of engineering tolerances in relation to angular resolution. We prove that improved control of the wedge angle by means of etch rate monitoring results in improved angular resolution. The results of this investigation will be used as the basis for future development in design for mass production.
[1]
Marc Tricard,et al.
Manufacture and Metrology of 300 mm Silicon Wafers with Ultra‐Low Thickness Variation
,
2007
.
[2]
U. Gösele,et al.
SemiConductor Wafer Bonding: Science and Technology
,
1998
.
[3]
Arjan L Mieremet,et al.
Fundamental spatial resolution of an x-ray pore optic.
,
2005,
Applied optics.
[4]
Carsten P. Jensen,et al.
Coating of silicon pore optics
,
2009,
Optical Engineering + Applications.
[5]
Marcos Bavdaz,et al.
Silicon pore optics for astrophysical x-ray missions
,
2007,
SPIE Optical Engineering + Applications.
[6]
Ulf Griesmann,et al.
Interferometric thickness calibration of 300 mm silicon wafers
,
2005,
International Commission for Optics.
[7]
H. Wolter.
Spiegelsysteme streifenden Einfalls als abbildende Optiken für Röntgenstrahlen
,
1952
.