Drilled alternating-layer three-dimensional photonic crystals having a full photonic band gap

We propose a three-dimensional photonic crystal structure having a wide full photonic band gap in the optical regime, which can be fabricated by an alternating-layer deposition and etching (drilling) process. This fabrication process is much simpler than that previously reported. The combination of current lithographic technology and autocloning bias-sputtering deposition is a promising way of realizing these photonic crystals.