Thin films of Ti–Nb–Zr as non-evaporable getter films

Thin films of Non-evaporable getter (NEG) Ti–Nb–Zr, have been deposited using a DC magnetron sputtering technique. The NEG films were produced from a Ti–Nb–Zr target in the form twisted wires of pure individual metals combined to give the appropriate stoichiometry. The performance and morphology dependence on deposition pressure, sputtering conditions and substrate surface roughness are investigated. Energy dispersive X-ray and X-ray photoelectron spectroscopic techniques are utilized to characterize and study the activation behaviour of the NEG thin films. After characterizing with surface techniques the activation temperature of this alloy is found to be in the range 250 – 300°C for 2 h heating with well defined composition. It is seen that film topography and density depend largely on the substrate surface roughness, while the activation temperature depends almost exclusively on the final stoichiometry of the thin film.