Radical assisted metalorganic chemical vapor deposition of CdTe on GaAs and carrier transport mechanism in CdTe/n-GaAs heterojunction

temperature range of 150‐300 °C. The grown films have high resistivity in the order of 10 7 V cm for the entire growth range. Applicability of this heteroepitaxial CdTe layer on n-GaAs as an x-ray detector was then investigated. The carrier transport mechanism of the CdTe/ n-GaAs heterojunction was studied by means of current‐voltage measurements at different temperatures. The forward current was characterized by multitunneling capture-emission current and space charge limited current. The reverse current was considered as the generation current from the heterojunction interface states through the analysis of capacitance‐voltage measurement. It is found that for devices using minority carriers, this heterojunction alone is not useful because of the high concentration of interface states. A suitable modification, like an isotype heterojunction between GaAs and CdTe before forming the p-n junction, seems to be necessary. © 1998 American Institute of Physics. @S0021-8979~98!03405-7#

[1]  Y. Hatanaka,et al.  Carrier transport mechanisms of p-type amorphous-n-type crystalline silicon heterojunctions , 1992 .

[2]  C. Ferekides,et al.  Thin-film junctions of cadmium telluride by metalorganic chemical vapor deposition , 1992 .

[3]  N. Salansky,et al.  CdTe films on (001) GaAs:Cr by molecular beam epitaxy , 1984 .

[4]  X. Fei,et al.  KINETIC AND INTERFACE STUDIES FOR MOCVD CDTE AND HGCDTE EPILAYERS GROWN ON GAAS SUBSTRATES , 1991 .

[5]  A. Waag,et al.  p‐type doping of CdTe with a nitrogen plasma source , 1996 .

[6]  E. Alves,et al.  Substrate effect on CdTe layers grown by metalorganic vapor phase epitaxy , 1997 .

[7]  N. Giles,et al.  Growth of (100)CdTe films of high structural perfection on (100)GaAs substrates by molecular beam epitaxy , 1984 .

[8]  M. Cuzin CdTe in photoconductive applications fast detector for metrology and X-ray imaging , 1992 .

[9]  M. Ekawa,et al.  Growth Characteristics and Electrical Properties of (100) CdTe Layers Grown on (100) GaAs by Low-Pressure Organometallic Vapor Phase Epitaxy , 1990 .

[10]  Y. Hatanaka,et al.  X-ray imaging camera tube using sputter-deposited CdTe/CdS heterojunction , 1993 .

[11]  N. Giles,et al.  Photon assisted growth of nitrogen-doped CdTe and the effects of hydrogen incorporation during growth , 1996 .

[12]  S. Ghandhi,et al.  OMVPE growth of CdTe on InSb substrates , 1986 .

[13]  J. E. Potts,et al.  Electrical characterization of p‐type ZnSe , 1989 .

[14]  W. Hoke,et al.  Metalorganic vapor deposition of CdTe and HgCdTe epitaxial films on InSb and GaAs substrates , 1984 .

[15]  C. Pai,et al.  Downstream microwave plasma‐enhanced chemical vapor deposition of oxide using tetraethoxysilane , 1990 .

[16]  Y. Hatanaka,et al.  Growth of ZnSe thin films by radical assisted MOCVD method , 1996 .

[17]  K. Nishitani,et al.  Molecular beam epitaxy of CdTe and Hg1-xCdxTe ON GaAs (100) , 1983 .

[18]  C. Peng,et al.  Defects in (100)CdTe epilayers grown on (100)GaAs by MOCVD , 1990 .

[19]  G. Russell,et al.  TEM studies of epitaxial CdTe and (Hg, Cd)Te grown by MOVPE on GaAs and CdTe substrates , 1988 .

[20]  P. Anderson The growth of CdTe/GaAs heteroepitaxial films by metal-organic chemical vapor deposition , 1986 .

[21]  Hideyo Okushi,et al.  Electrical properties of n-amorphous/p-crystalline silicon heterojunctions , 1984 .