Role of Gallium Doping in Dramatically Lowering Amorphous‐Oxide Processing Temperatures for Solution‐Derived Indium Zinc Oxide Thin‐Film Transistors

[*] Prof. T. J. Marks, Dr. A. Facchetti, Dr. S. Jeong, Y.-G. Ha Department of Chemistry and the Materials Research Center Northwestern University 2145 Sheridan Road, Evanston, IL 60208 (USA) E-mail: t-marks@northwestern.edu; a-facchetti@northwestern.edu Prof. J. Moon Department of Materials Science and Engineering Yonsei University 134 Shinchon-dong, Seodaemun-gu, Seoul 120-749 (Korea) [+] Present address: Korea Research Institute of Chemical Technology, 19 Sinseongno, Yuseong, Daejeon 305-600 (Korea)

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