A closed-form analytical forward transit time model considering specific models for bandgap-narrowing effects and concentration-dependent diffusion coefficients for BJT devices operating at 77 K
暂无分享,去创建一个
Jin-Hau Kuo | T.-C. Lu | J. Kuo | T. Lu
[1] H. C. de Graaff,et al. Measurements of bandgap narrowing in Si bipolar transistors , 1976 .
[3] David L. Harame,et al. Base profile design for high-performance operation of bipolar transistors at liquid-nitrogen temperature , 1989 .
[4] Kunihiro Suzuki. Unified minority-carrier transport equation for polysilicon or heteromaterial emitter contact bipolar transistors , 1991 .
[5] S. Selberherr. MOS device modeling at 77 K , 1989 .
[6] Jin-Hau Kuo,et al. An analytical bandgap-narrowing-related current-gain model for BJT devices operating at 77 K , 1992 .
[7] R. M. Swanson,et al. VIB-4 temperature dependence of minority electron mobility and bandgap narrowing in p + Si , 1987 .
[8] W. Dumke. The effect of base doping on the performance of Si bipolar transistors at low temperatures , 1981, IEEE Transactions on Electron Devices.
[9] W. Sinke,et al. Minority-carrier transport in nonuniformly doped silicon-an analytical approach , 1990 .
[10] Robert Mertens,et al. An analytical model for the determination of the transient response of CML and ECL gates , 1990 .
[11] H. C. Poon,et al. High injection in epitaxial transistors , 1969 .
[12] K. Jenkins,et al. On the low-temperature static and dynamic properties of high-performance silicon bipolar transistors , 1989 .
[13] R.D. Gardner,et al. A new approach to optimizing the base profile for high-speed bipolar transistors , 1990, IEEE Electron Device Letters.
[14] Kunihiro Suzuki. Emitter and base transit time of polycrystalline silicon emitter contact bipolar transistors , 1991 .
[15] Robert W. Dutton,et al. Two-dimensional transient analysis of a collector-up ECL inverter , 1989, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..
[16] W. Dumke. Effect of minority carrier trapping on the low-temperature characteristics of Si transistors , 1970 .
[17] R. M. Swanson,et al. Simultaneous measurement of hole lifetime, hole mobility and bandgap narrowing in heavily doped n-type silicon , 1985, 1985 International Electron Devices Meeting.
[18] Herbert Kroemer,et al. Two integral relations pertaining to the electron transport through a bipolar transistor with a nonuniform energy gap in the base region , 1985 .
[19] K. Shimohigashi,et al. A high-current-gain low-temperature pseudo-heterojunction bipolar transistor utilizing sidewall base-contact structure (SICOS) , 1991 .
[20] Jin-Hau Kuo,et al. An analytical pull-up transient model for a BiCMOS inverter , 1992 .
[21] James D. Plummer,et al. Optimization of silicon bipolar transistors for high current gain at low temperatures , 1988 .
[22] D. Tang. Heavy doping effects in p-n-p bipolar transistors , 1980, IEEE Transactions on Electron Devices.
[23] Kunihiro Suzuki,et al. Optimum base doping profile for minimum base transit time , 1991 .
[24] J. Kuo,et al. Two-dimensional analysis of a BiNMOS transistor operating at 77 K using a modified PISCES program , 1992 .