A closed-form analytical forward transit time model considering specific models for bandgap-narrowing effects and concentration-dependent diffusion coefficients for BJT devices operating at 77 K

The authors report a closed-form analytical low-temperature forward transit time model considering bandgap-narrowing effects and concentration-dependent diffusion coefficients based on the entire shape of the emitter and base doping profiles for bipolar junction transistor (BJT) devices operating at 77 K. As verified by the PISCES simulation results, the new closed-form analytical model provides a better low-temperature forward transit time model compared to the model in which bandgap-narrowing effects and concentration-dependent diffusion coefficients are not considered. >

[1]  H. C. de Graaff,et al.  Measurements of bandgap narrowing in Si bipolar transistors , 1976 .

[2]  An analytical bandgap-narrowing-related current-gain model including concentration dependent diffusion coefficients for VLSI BJT devices , 1992 .

[3]  David L. Harame,et al.  Base profile design for high-performance operation of bipolar transistors at liquid-nitrogen temperature , 1989 .

[4]  Kunihiro Suzuki Unified minority-carrier transport equation for polysilicon or heteromaterial emitter contact bipolar transistors , 1991 .

[5]  S. Selberherr MOS device modeling at 77 K , 1989 .

[6]  Jin-Hau Kuo,et al.  An analytical bandgap-narrowing-related current-gain model for BJT devices operating at 77 K , 1992 .

[7]  R. M. Swanson,et al.  VIB-4 temperature dependence of minority electron mobility and bandgap narrowing in p + Si , 1987 .

[8]  W. Dumke The effect of base doping on the performance of Si bipolar transistors at low temperatures , 1981, IEEE Transactions on Electron Devices.

[9]  W. Sinke,et al.  Minority-carrier transport in nonuniformly doped silicon-an analytical approach , 1990 .

[10]  Robert Mertens,et al.  An analytical model for the determination of the transient response of CML and ECL gates , 1990 .

[11]  H. C. Poon,et al.  High injection in epitaxial transistors , 1969 .

[12]  K. Jenkins,et al.  On the low-temperature static and dynamic properties of high-performance silicon bipolar transistors , 1989 .

[13]  R.D. Gardner,et al.  A new approach to optimizing the base profile for high-speed bipolar transistors , 1990, IEEE Electron Device Letters.

[14]  Kunihiro Suzuki Emitter and base transit time of polycrystalline silicon emitter contact bipolar transistors , 1991 .

[15]  Robert W. Dutton,et al.  Two-dimensional transient analysis of a collector-up ECL inverter , 1989, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[16]  W. Dumke Effect of minority carrier trapping on the low-temperature characteristics of Si transistors , 1970 .

[17]  R. M. Swanson,et al.  Simultaneous measurement of hole lifetime, hole mobility and bandgap narrowing in heavily doped n-type silicon , 1985, 1985 International Electron Devices Meeting.

[18]  Herbert Kroemer,et al.  Two integral relations pertaining to the electron transport through a bipolar transistor with a nonuniform energy gap in the base region , 1985 .

[19]  K. Shimohigashi,et al.  A high-current-gain low-temperature pseudo-heterojunction bipolar transistor utilizing sidewall base-contact structure (SICOS) , 1991 .

[20]  Jin-Hau Kuo,et al.  An analytical pull-up transient model for a BiCMOS inverter , 1992 .

[21]  James D. Plummer,et al.  Optimization of silicon bipolar transistors for high current gain at low temperatures , 1988 .

[22]  D. Tang Heavy doping effects in p-n-p bipolar transistors , 1980, IEEE Transactions on Electron Devices.

[23]  Kunihiro Suzuki,et al.  Optimum base doping profile for minimum base transit time , 1991 .

[24]  J. Kuo,et al.  Two-dimensional analysis of a BiNMOS transistor operating at 77 K using a modified PISCES program , 1992 .