Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering.
暂无分享,去创建一个
K. Geib | H. Demiryont | H Demiryont | J R Sites | K Geib | J. Sites
[1] J. Sites,et al. Ion Beam Sputter Deposition Of Optical Coatings , 1983 .
[2] P. Ficalora,et al. The reactive sputtering of tantalum oxide: Compositional uniformity, phases, and transport mechanisms , 1983 .
[3] J. Albella,et al. Optical properties of reactively sputtered Ta2O5 films , 1982 .
[4] J. M. Albella,et al. Sputtered Ta2O5 antireflection coatings for silicon solar cells , 1982 .
[5] S. Schiller,et al. Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films , 1979 .
[6] D. Wheeler,et al. Adherence of sputtered titanium carbides , 1979 .
[7] F. Hickernell,et al. Effects of deposition parameters on optical loss for rf‐sputtered Ta2O5 and Si3N4 waveguides , 1979 .
[8] E. Khawaja,et al. The optical properties of thin films of tantalum pentoxide and zirconium dioxide , 1975 .
[9] Y. C. Cheng,et al. Losses in tantalum pentoxide waveguides , 1974 .
[10] P. Tien. Light waves in thin films and integrated optics. , 1971, Applied optics.
[11] F. Urbach. The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids , 1953 .
[12] S. Ingrey,et al. Effect of pressure on the properties of reactively sputtered Ta2O5 , 1974 .
[13] W. Westwood,et al. ANODIC OXIDATION OF TANTALUM. , 1971 .