Hetero-epitaxy of high quality germanium film on silicon substrate for optoelectronic integrated circuit applications
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Wei Li | Chuan Seng Tan | Jurgen Michel | Eugene A. Fitzgerald | P. Anantha | Lin Zhang | Yiding Lin | Shuyu Bao | C. S. Tan | E. Fitzgerald | J. Michel | Yiding Lin | K. Lee | Yue Wang | Shuyu Bao | Wei Li | P. Anantha | Lin Zhang | Kwang Hong Lee | Yue Wang
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