Fabrication of integrated inductors on silicon for fully integrated DC-DC microconverters
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Yves Lembeye | Jean-Louis Sanchez | David Bourrier | Norbert Fabre | Veronique Conedera | Monique Dilhan | Herve Morel | Ghislain Troussier | Jean-Pierre Laur | Bruno Cogitore
[1] Steven J. Holmes,et al. Negative photoresists for optical lithography , 1997, IBM J. Res. Dev..
[2] Peter Vettiger,et al. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS , 1998 .
[3] D. Schwartz,et al. Characterization of Ni x Fe1 − x ( 0.10 < x < 0.95 ) Electrodeposition from a Family of Sulfamate‐Chloride Electrolytes , 1999 .
[4] Daniel T. Schwartz,et al. In-situ fabrication of sacrificial layers in electrodeposited NiFe microstructures , 1999 .
[5] Jane M. Shaw,et al. Micromachining applications of a high resolution ultrathick photoresist , 1995 .
[6] D. F. Moore,et al. SU-8 thick photoresist processing as a functional material for MEMS applications , 2002 .
[7] M. Despont,et al. SU-8: a low-cost negative resist for MEMS , 1997 .
[8] Jian Zhang,et al. Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems (MEMS) , 2001 .
[9] S.C.O. Mathuna,et al. Thick photoresist development for the fabrication of high aspect ratio magnetic coils , 2002 .
[10] Mark G. Allen,et al. Micromachined planar inductors on silicon wafers for MEMS applications , 1998, IEEE Trans. Ind. Electron..