论文信息 - Estimation of the dielectric properties of low-k materials using optical spectroscopy

Estimation of the dielectric properties of low-k materials using optical spectroscopy

The dielectric function spectra of low dielectric constant (low-k) materials have been determined using spectroscopic ellipsometry, near-normal incidence spectroscopic reflectometry, and Fourier transform infrared transmission spectrometry over a wide spectral range from 0.03 to 5.4 eV (230 nm to 40.5 μm wavelength region). The electronic and ionic contributions to the overall static dielectric constant were determined for representative materials used in the semiconductor industry for interlayer dielectrics: (1) FLARE—organic spin-on polymer, (2) HOSP—spin-on hybrid organic-siloxane polymer from the Honeywell Electronic Materials Company, and (3) SiLK—organic dielectric resin from the Dow Chemical Company. The main contributions to the static dielectric constant of the low-k materials studied were found to be the electronic and ionic absorptions.

[1] M. Oye,et al. Low dielectric constant Parylene-F-like films for intermetal dielectric applications , 1999 .

[2] Kamil Postava,et al. Doping effects on optical properties of epitaxial ZnO layers determined by spectroscopic ellipsometry , 2001 .

[3] Nobuo Aoi,et al. Novel Porous Films Having Low Dielectric Constants Synthesized by Liquid Phase Silylation of Spin-On Glass Sol for Intermetal Dielectrics , 1997 .

[4] M. R. Baklanov,et al. Determination of pore size distribution in thin films by ellipsometric porosimetry , 2000 .

[5] Sung-Woong Chung,et al. Dielectric Properties of Hydrogen Silsesquioxane Films Degraded by Heat and Plasma Treatment , 1999 .

[6] E. Palik. Handbook of Optical Constants of Solids , 1997 .

[7] Kamil Postava,et al. Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry , 2001 .

[8] C. Kittel. Introduction to solid state physics , 1954 .

[9] Kamil Postava,et al. Spectroscopic ellipsometry of epitaxial ZnO layer on sapphire substrate , 2000 .

[10] Optical functions of low-k materials for interlayer dielectrics , 2001 .

[11] K. Postava,et al. Characterization of organic low-dielectric-constant materials using optical spectroscopy. , 2001, Optics express.

[12] E. Aydil,et al. Reasons for lower dielectric constant of fluorinated SiO2 films , 1998 .