Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys
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M. Bram | A. Mutzke | C. Linsmeier | J. Coenen | M. Rasinski | J. Gonzalez‐Julian | A. Litnovsky | A. Kreter | T. Wegener | P. Hansen | X. Tan | N. Aghdassi | A. Eksaeva | J. Schmitz | J. Coenen | F. Klein | A. Litnovsky