Statistics for electromigration testing

A comprehensive statistical basis is given for the design and conduction of electromigration stress tests that allows for the efficient use of test parts, equipment, and test time. It shows how to select the size of the sample, the required control of the stress conditions, and the number of failures required before halting the test in order to characterize metallization interconnects with a quantifiable level of confidence. The results are applicable to any failure mechanism for which the failure times obey a normal or log-normal distribution. >

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