论文信息 - Thermodynamic Analysis of the Behavior of Trimethyl Borate as a Precursor for Chemical Vapor Deposition of Boron-Containing Films - 字舞流文

Thermodynamic Analysis of the Behavior of Trimethyl Borate as a Precursor for Chemical Vapor Deposition of Boron-Containing Films

V. Shestakov | M. Kosinova | V. Kosyakov

[1] Mengjia Yuan,et al. Formation of boron nitride coatings on silicon carbide fibers using trimethylborate vapor , 2016 .

[2] V. Shestakov,et al. Calculation of phase equilibria between the gas and the solid phases in the Nb-I and He-Nb-I systems , 2015, Russian Journal of Inorganic Chemistry.

[3] S. Gsell,et al. Increasing the wear resistance by interstitial alloying with boron via chemical vapor deposition. , 2013, Langmuir : the ACS journal of surfaces and colloids.

[4] S. Gsell,et al. Epitaxial growth of hexagonal boron nitride monolayers by a three-step boration-oxidation-nitration process , 2010 .

[5] D. Garvin,et al. CODATA thermodynamic tables , 1987 .

[6] R. Köster. The Organic Chemistry of Boron, von W. Gerrard. Academic Press, London-New York 1961. 1. Aufl., X, 308 S., 28 Tab., geb. $ 2.15.0 , 1963 .