论文信息 - InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides - 字舞流文

InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

F. Pommereau | J. Leclercq | C. Cardinaud | J. Jiménez | S. Guilet | A. Rhallabi | J. Landesman | M. Avella | B. Liu | M. González