论文信息 - Extreme ultraviolet nanolithography for ULSI: A review

Extreme ultraviolet nanolithography for ULSI: A review

The basic concepts of high-resolution extreme ultraviolet nanolithography, which is aimed at producing ultra-large-scale integrated circuits (with an integration one or two orders of magnitude exceeding present-day integration levels), are reviewed and substantiated. The problems in and the current status of this field of technology are considered.

R. P. Seisyan

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