Investigation of the chemical state of ultrathin Hf-Al-O films during high temperature annealing [rapid communication]
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N. Lee | R. Sinclair | H. Chang | M. Cho | D. Ko | D. Moon | J. H. Lee | Y. Cho | K. Min | Sung-Kwan Kang | J.J. Gu | J. Gu | M. H. Cho | R. Sinclair | Seung-Hee Kang | K. Min | Yeol Je Cho