论文信息 - Feature size reduction of silicon slot waveguides by partial filling using atomic layer deposition

Feature size reduction of silicon slot waveguides by partial filling using atomic layer deposition

We propose a novel method to realize silicon-on-insulator (SOI)-based air slot waveguides for sensing applications. The method, based on feature size reduction using conformal thin films grown by atomic layer deposition (ALD), enables a guided slot mode in a silicon slot waveguide with a patterned slot width of more than 200 nm. Feature size reduction of slot structures with ALD grown amorphous TiO2 is demonstrated.

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