Patterning of Narrow Au Nanocluster Lines Using V2O5 Nanowire Masks and Ion-Beam Milling
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M. Ancona | W. Kruppa | Doewon Park | S. Kooi | L. Whitman | E. Foos | and Arthur W. Snow | L. Shirey | A. W. Snow
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M. Ancona | W. Kruppa | Doewon Park | S. Kooi | L. Whitman | E. Foos | and Arthur W. Snow | L. Shirey | A. W. Snow