An improved semi-classical Monte-Carlo approach for nano-scale MOSFET simulation
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Enrico Sangiorgi | Claudio Fiegna | Pierpaolo Palestri | Luca Selmi | David Esseni | Simone Eminente | L. Selmi | C. Fiegna | D. Esseni | P. Palestri | E. Sangiorgi | S. Eminente
[1] F. Stern,et al. Electronic properties of two-dimensional systems , 1982 .
[2] J. Autran,et al. Two-dimensional modeling of quantum ballistic transport in ultimate double-gate SOI devices , 2003 .
[3] L. Selmi,et al. Carrier quantization in SOI MOSFETs using an effective potential based Monte-Carlo tool , 2003, ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003..
[4] L. Selmi,et al. Low field mobility of ultra-thin SOI N- and P-MOSFETs: Measurements and implications on the performance of ultra-short MOSFETs , 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).
[5] L. Selmi,et al. An experimental study of mobility enhancement in ultrathin SOI transistors operated in double-gate mode , 2003 .
[6] Umberto Ravaioli,et al. Monte Carlo simulations of double-gate MOSFETs , 2003 .
[7] D. Ferry,et al. Transport in nanostructures , 1999 .
[8] E. Sangiorgi,et al. A semi-empirical model of surface scattering for Monte Carlo simulation of silicon n-MOSFETs , 1992 .
[9] S. Datta,et al. The non-equilibrium Green's function (NEGF) formalism: An elementary introduction , 2002, Digest. International Electron Devices Meeting,.
[10] C. Jungemann,et al. Simulation of linear and nonlinear electron transport in homogeneous silicon inversion layers , 1993 .
[11] M. Anantram,et al. Role of scattering in nanotransistors , 2002, cond-mat/0211069.
[12] K. Hess,et al. A full-band Monte Carlo model for silicon nanoscale devices with a quantum mechanical correction of the potential , 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).
[13] C. Jacoboni,et al. The Monte Carlo method for the solution of charge transport in semiconductors with applications to covalent materials , 1983 .
[14] L. Selmi,et al. Physically based modeling of low field electron mobility in ultrathin single- and double-gate SOI n-MOSFETs , 2003 .
[15] S. Takagi,et al. On the universality of inversion layer mobility in Si MOSFET's: Part I-effects of substrate impurity concentration , 1994 .
[16] D. Vasileska,et al. Quantum effects in MOSFETs: use of an effective potential in 3D Monte Carlo simulation of ultra-short channel devices , 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).
[17] D. Esseni,et al. On the modeling of surface roughness limited mobility in SOI MOSFETs and its correlation to the transistor effective field , 2004, IEEE Transactions on Electron Devices.
[18] L. Selmi,et al. Closed- and open-boundary models for gate-current calculation in n-MOSFETs , 2001 .
[19] S. Takagi,et al. Influences of buried-oxide interface on inversion-layer mobility in ultra-thin SOI MOSFETs , 2002 .
[20] David K. Ferry,et al. Implementation of surface roughness scattering in Monte Carlo modeling of thin SOI MOSFETs using the effective potential , 2003 .
[21] M. Lundstrom,et al. Essential physics of carrier transport in nanoscale MOSFETs , 2002 .
[22] M. Lundstrom. Fundamentals of carrier transport , 1990 .
[23] Fischetti,et al. Monte Carlo study of electron transport in silicon inversion layers. , 1993, Physical review. B, Condensed matter.
[24] Umberto Ravaioli,et al. A quantum correction based on Schrodinger equation applied to Monte Carlo device simulation , 2003 .