Since 195D many studies have been devoted to physical and chemical trans-Formations in plasmas. In this paper we do not propose to make an exhaustive overview but to underline the main development points oF plasma chemistry. First after a brie-F historical review, we present the plasma chemical reactors and describe the difFerent types oF plasma generators. We discuss then oF the two main parameters to be taken into account in plasma chemical reactor : mixing oF the reactants and quenching. We examine models taking into account kinetics, diffusion and mixing oF reactants and also the catalysis problems. Secondly we recall the energetic situation and the advantages oF plasma chemical reactors. We review the actual industrial plasma processes, essentially surFace treatment and spraying, spheroTdization, ultra-Fine powders production, remelting, ozone production and we try to guess what will be the -Future tendencies in the industrial development of plasma processes either -For high quantity production and -For high commercial added value products. In the third part we deal with the diagnostic techniques. For the plasma, attention is given to the assumptions involved in each techniques specially with regard to the local thermodynamic equilibrium. We describe a -Few techniqueso-F measurement oF the temperature and population oF excited species by emission and absorption, enhancing the advantages oF laser light scattering. For the condenses particles injected in a plasma jet we present the most recent techniques to measure in -Flight their velocity (LDA), their temperature (statistical pyrometry) their diameter and their -Flux. In the last part, through -Four examples : nitric oxide synthesis, acetylene production, plasma spraying and extractive metallurgy we try to show, what progress the development oF the measuring techniques and oF the modelisation has brought and what is still to be made.
[1]
S. H. Storey,et al.
The computation of chemical equilibria
,
1970
.
[2]
R. Prud’homme,et al.
Équations fondamentales de l'aérothermochimie
,
1973
.
[3]
Russian Journal of Physical Chemistry
,
1960,
Nature.
[4]
R. Kumar.
Characterization of plasma-etching for semiconductor applications
,
1975
.
[5]
J. Lennard-jones,et al.
Molecular Spectra and Molecular Structure
,
1929,
Nature.
[6]
Spectrochimica Acta
,
1939,
Nature.
[7]
H. Nomoto,et al.
On the Glow Discharge
,
1957
.
[8]
M. G. Fey,et al.
Plasma heating devices in the electric energy economy
,
1976
.
[9]
A. Hall.
Applied Optics.
,
2022,
Science.
[10]
G. Mills,et al.
Particle-size Measurement
,
1948,
Nature.
[11]
R. H. Fowler.
The Mathematical Theory of Non-Uniform Gases
,
1939,
Nature.
[12]
E. Crescini.
Journal de Physique
,
1895
.
[13]
S. N. Ruddlesden.
Special Ceramics
,
1962,
Nature.
[14]
W. Kern,et al.
Advances in deposition processes for passivation films
,
1977
.
[15]
M. Venugopalan,et al.
Reactions under plasma conditions
,
1971
.
[16]
N. Peacock,et al.
Plasma Diagnostics
,
1972,
Nature.
[17]
T. G. Cowling.
Kinetic processes in gases and plasmas : edited by A.R. Rochstim. 458 pages, diagrams, 6 × 9 in. New York, Academic Press, 1969. Price, $22.50.
,
1970
.
[18]
G. Eoker.
Electrode components of the arc discharge
,
1961
.
[19]
T. P. Wallace.
The scattering of light and other electromagnetic radiation by Milton Kerker. Academic Press, New York, 1969. 666 + xv pp. $33.50
,
1970
.
[20]
J. W.,et al.
The Journal of Physical Chemistry
,
1900,
Nature.
[21]
Journal of Chemical Physics
,
1932,
Nature.