Thin film growth of MAX phases as functional materials
暂无分享,去创建一个
[1] Y. Gogotsi,et al. Ten Years of Progress in the Synthesis and Development of MXenes , 2021, Advanced materials.
[2] M. Farle,et al. Pulsed laser deposition of epitaxial Cr2AlC MAX phase thin films on MgO(111) and Al2O3(0001) , 2021, Materials Research Letters.
[3] Yudong Fu,et al. Deposition of Nb-Si-C Thin Films by Radio Frequency Magnetron Sputtering , 2021, Coatings.
[4] M. Tunes,et al. Deviating from the pure MAX phase concept: Radiation-tolerant nanostructured dual-phase Cr2AlC , 2021, Science Advances.
[5] J. Vleugels,et al. Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target , 2021 .
[6] A. Bund,et al. Development of the phase composition and the properties of Ti2AlC and Ti3AlC2 MAX-phase thin films – A multilayer approach towards high phase purity , 2021 .
[7] W. Xia,et al. MAX Phases as Nanolaminate Materials: Chemical Composition, Microstructure, Synthesis, Properties, and Applications , 2021, Advanced Engineering Materials.
[8] P. Eklund,et al. Effects of temperature and target power on the sputter-deposition of (Ti,Zr)n+1AlCn MAX-phase thin films , 2020 .
[9] J. Gonzalez‐Julian. Processing of MAX phases: From synthesis to applications , 2020, Journal of the American Ceramic Society.
[10] T. Ouisse,et al. Near Fermi level electronic structure of Ti3SiC2 revealed by angle-resolved photoemission spectroscopy , 2020 .
[11] Jun Lu,et al. Formation of Ti2AuN from Au-Covered Ti2AlN Thin Films: A General Strategy to Thermally Induce Intercalation of Noble Metals into MAX Phases , 2020, Crystal Growth & Design.
[12] S. Ogale,et al. Growth, Properties, and Applications of Pulsed Laser Deposited Nanolaminate Ti3AlC2 Thin Films , 2020, 2007.04798.
[13] M. Sokol,et al. A progress report on the MAB phases: atomically laminated, ternary transition metal borides , 2019, International Materials Reviews.
[14] J. Schneider,et al. Remote Tracking of Phase Changes in Cr2AlC Thin Films by In-situ Resistivity Measurements , 2019, Scientific Reports.
[15] V. Natu,et al. On the Chemical Diversity of the MAX Phases , 2019, Trends in Chemistry.
[16] E. Coy,et al. Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD , 2019, Materials Research Letters.
[17] Y. Gogotsi,et al. Control of MXenes’ electronic properties through termination and intercalation , 2019, Nature Communications.
[18] F. Eriksson,et al. Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound target , 2019, Journal of Vacuum Science & Technology A.
[19] Kyeong Tae Kang,et al. Synergetic Behavior in 2D Layered Material/Complex Oxide Heterostructures , 2018, Advanced materials.
[20] F. Mücklich,et al. Solid state formation of Ti4AlN3 in cathodic arc deposited (Ti1-xAlx)N-y alloys , 2017 .
[21] M. Andersson,et al. Synthesis of Ti3AuC2, Ti3Au2C2 and Ti3IrC2 by noble metal substitution reaction in Ti3SiC2 for high-temperature-stable Ohmic contacts to SiC. , 2017, Nature materials.
[22] Aiying Wang,et al. Dense and high-stability Ti2AlN MAX phase coatings prepared by the combined cathodic arc/sputter technique , 2017 .
[23] P. Eklund,et al. Layered ternary M n+1AX n phases and their 2D derivative MXene: an overview from a thin-film perspective , 2017 .
[24] Haibin Zhang,et al. Deposition and characterization of Ti2AlC MAX phase and Ti3AlC thin films by magnetron sputtering , 2016 .
[25] Á. Ingason,et al. Magnetic MAX phases from theory and experiments; a review , 2016, Journal of physics. Condensed matter : an Institute of Physics journal.
[26] M. Farle,et al. Thin film synthesis and characterization of a chemically ordered magnetic nanolaminate (V,Mn)3GaC2 , 2016 .
[27] Á. Ingason,et al. Toward Structural Optimization of MAX Phases as Epitaxial Thin Films , 2016 .
[28] B. Alling,et al. Magnetically driven anisotropic structural changes in the atomic laminate M n 2 GaC , 2016 .
[29] Aiying Wang,et al. Preparation of Ti2AlC MAX Phase Coating by DC Magnetron Sputtering Deposition and Vacuum Heat Treatment , 2015 .
[30] Jun Lu,et al. A magnetic atomic laminate from thin film synthesis: (Mo0.5Mn0.5)2GaC , 2015 .
[31] M. Farle,et al. Magnetic Anisotropy in the (Cr0.5Mn0.5)2GaC MAX Phase , 2015 .
[32] Jun Lu,et al. Synthesis and characterization of magnetic (Cr0.5Mn0.5)2GaC thin films , 2015, Journal of Materials Science.
[33] P. Schaaf,et al. Tribological behavior of selected Mn + 1AXn phase thin films on silicon substrates , 2014 .
[34] Kevin M. Cook,et al. Transparent Conductive Two-Dimensional Titanium Carbide Epitaxial Thin Films , 2014, Chemistry of materials : a publication of the American Chemical Society.
[35] J. Pezoldt,et al. Nanostructured plasma etched, magnetron sputtered nanolaminar Cr2AlC MAX phase thin films , 2014 .
[36] Jun Lu,et al. Phase stability of Crn+ 1GaCn MAX phases from first principles and Cr2GaC thin‐film synthesis using magnetron sputtering from elemental targets , 2013 .
[37] J. Schneider,et al. Growth of V–Al–C thin films by direct current and high power impulse magnetron sputtering from a powder metallurgical composite target , 2013 .
[38] J. Colligon,et al. Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C , 2013 .
[39] L. Piraux,et al. Anisotropy of the resistivity and charge-carrier sign in nanolaminated Ti_{2}AlC: Experiment and ab initio calculations , 2013 .
[40] J. Emmerlich,et al. Synthesis and ab initio calculations of nanolaminated (Cr,Mn)2AlC compounds , 2013 .
[41] Jun Lu,et al. Phase stability and initial low-temperature oxidation mechanism of Ti2AlC thin films , 2013 .
[42] M. Barsoum,et al. MAX phases : Bridging the gap between metals and ceramics MAX phases : Bridging the gap between metals and ceramics , 2013 .
[43] P. Schaaf,et al. Formation of Ti2AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing , 2012 .
[44] S. Lofland,et al. Combinatorial investigation of the stoichiometry, electronic transport and elastic properties of (Cr1-xVx)2GeC thin films , 2012 .
[45] Ulf Jansson,et al. The Mn+1AXn phases: Materials science and thin-film processing , 2010 .
[46] L. Hultman,et al. Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlC , 2010 .
[47] Y. Ikuhara,et al. Growth and Microstructure of Epitaxial Ti3SiC2 Contact Layers on SiC , 2009 .
[48] S. Lofland,et al. Synthesis and characterization of Nb2AlC thin films , 2009 .
[49] Yanchun Zhou,et al. In Situ Reaction Synthesis, Electrical and Thermal, and Mechanical Properties of Nb4AlC3 , 2008 .
[50] R. Ahuja,et al. Optical properties of Ti3SiC2 and Ti4AlN3 , 2008 .
[51] S. Lofland,et al. Weak electronic anisotropy in the layered nanolaminate Ti 2 GeC , 2008 .
[52] Yanchun Zhou,et al. New MAX‐Phase Compounds in the V–Cr–Al–C System , 2008 .
[53] J. Emmerlich,et al. Electrical resistivity of Ti_n_+1AC_n (A = Si, Ge, Sn, n = 1–3) thin films , 2007 .
[54] M. Bilek,et al. Deposition of epitaxial Ti2AlC thin films by pulsed cathodic arc , 2007 .
[55] N. Schell,et al. Phase stability of epitaxially grown Ti2AlN thin films , 2006 .
[56] R. Ahuja,et al. Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering , 2006 .
[57] R. Ahuja,et al. Electronic structure investigation of Ti3 AlC2 , Ti3 SiC2 , and Ti3 GeC2 by soft x-ray emission spectroscopy , 2005, 1112.6360.
[58] S. Jacques,et al. Pulsed reactive chemical vapor deposition in the C-Ti-Si system from H2/TiCl4/SiCl4 , 2005 .
[59] J. Emmerlich,et al. Epitaxial Ti_2GeC, Ti_3GeC_2, and Ti_4GeC_3 MAX-phase thin films grown by magnetron sputtering , 2005 .
[60] Ola Wilhelmsson,et al. Growth and characterization of MAX-phase thin films , 2005 .
[61] J. Emmerlich,et al. Growth of Ti3SiC2 thin films by elemental target magnetron sputtering , 2004 .
[62] U. Jansson,et al. Deposition of Ti2AlC and Ti3AlC2 epitaxial films by magnetron sputtering , 2004 .
[63] S. T. Patton,et al. Pulsed Laser Deposition and Properties of Mn+1AXn Phase Formulated Ti3SiC2 Thin Films , 2004 .
[64] M. Forte-Poisson,et al. Ti3SiC2 formed in annealed Al/Ti contacts to p-type SiC , 2003 .
[65] U. Jansson,et al. Magnetron sputtered epitaxial single-phase Ti3SiC2 thin films , 2002 .
[66] James E. Krzanowski,et al. Structural and mechanical properties of TiC and Ti–Si–C films deposited by pulsed laser deposition , 2001 .
[67] Michel W. Barsoum,et al. The MAX Phases: Unique New Carbide and Nitride Materials , 2001, American Scientist.
[68] W. J. Lackey,et al. CVD of Ti3SiC2 , 2000 .
[69] P. Finkel,et al. Low temperature dependencies of the elastic properties of Ti4AlN3, Ti3Al1.1C1.8, and Ti3SiC2 , 2000 .
[70] Michel W. Barsoum,et al. The MN+1AXN phases: A new class of solids , 2000 .
[71] M. Barsoum,et al. Synthesis and Characterization of a Remarkable Ceramic: Ti3SiC2 , 1996 .
[72] C. Bernard,et al. On the chemical vapour deposition of Ti3SiC2 from TiCl4-SiCl4-CH4-H2 gas mixtures , 1994 .
[73] T. Hirai,et al. Chemically vapor deposited Ti3SiC2 , 1987 .
[74] H. Nowotny,et al. Kohlenstoffhaltige ternäre Verbindungen (H-Phase) , 1963 .