Magnetoimpedance effect in structured multilayered amorphous thin films

In this work, we report magnetoimpedance (MI) results for frequencies of up to 1.8 GHz in a series of as deposited nano-structured [F/Cu/F] and [F/i/Cu/i/F] films where F is a Fe-rich alloy/Cu multilayer and i is a SiO2 insulating layer. A high MI ratio (205%) was obtained at 180 MHz for the [F/i/Cu/i/F] structure. The results are analysed in terms of the SiO2 insulating layer geometry and of the widths of the ferromagnetic and conductive layers.

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