Pattern design of fixed abrasive pads inspired by the bee colony theory
暂无分享,去创建一个
Zhen Yan | Zhongwei Hu | Yanfen Lin | Congfu Fang | Zaixing Zhao | Yanfen Lin | Zhongwei Hu | C. Fang | Zaixing Zhao | Zhen Yan
[1] A. Philipossian,et al. Impact of Novel Pad Groove Designs on Removal Rate and Uniformity of Dielectric and Copper CMP , 2004 .
[2] Dragos Axinte,et al. Textured grinding wheels: A review , 2016 .
[3] Haobo Cheng,et al. An investigation of the effects of the tool path on the removal of material in polishing , 2010 .
[4] David Dornfeld,et al. Effects of abrasive size distribution in chemical mechanical planarization: modeling and verification , 2003 .
[5] T. Suzuki,et al. Effect of Pad Groove Designs on the Frictional and Removal Rate Characteristics of ILD CMP , 2005 .
[6] Hong Hocheng,et al. Effects of kinematic variables on nonuniformity in chemical mechanical planarization , 2000 .
[7] G. Muldowney,et al. On the Relationship of CMP Wafer Nanotopography to Groove-Scale Slurry Transport , 2005 .
[8] Yanfen Lin,et al. Influence of fixed abrasive configuration on the polishing process of silicon wafers , 2017 .
[9] Jan C. Aurich,et al. Influence of kinematics and abrasive configuration on the grinding process of glass , 2013 .
[10] R. Kang,et al. Effects of kinematic forms on material removal rate and non-uniformity in chemical mechanical planarisation , 2008 .
[11] Hyunseop Lee,et al. Effect of pad groove geometry on material removal characteristics in chemical mechanical polishing , 2012 .
[12] Jian Xiu Su,et al. Modeling and Analyzing on Nonuniformity of Material Removal in Chemical Mechanical Polishing of Silicon Wafer , 2004 .
[13] G. Spur,et al. Influence of Kinematics on the Face Grinding Process on Lapping Machines , 1999 .
[14] Zhichao Dong,et al. Study on removal mechanism and removal characters for SiC and fused silica by fixed abrasive diamond pellets , 2014 .
[15] Dervis Karaboga,et al. A powerful and efficient algorithm for numerical function optimization: artificial bee colony (ABC) algorithm , 2007, J. Glob. Optim..
[17] Yanfen Lin,et al. Speed ratio optimization for ceramic lapping with fixed diamond pellets , 2017 .
[18] Pattern Optimization for Phyllotactic Fixed Abrasive Pads Based on the Trajectory Method , 2017, IEEE Transactions on Semiconductor Manufacturing.
[19] Yebing Tian,et al. An analytical investigation of pad wear caused by the conditioner in fixed abrasive chemical–mechanical polishing , 2015 .
[20] Alok Singh,et al. A hybrid artificial bee colony algorithm for the cooperative maximum covering location problem , 2017, Int. J. Mach. Learn. Cybern..
[21] F. W. Preston. The Theory and Design of Plate Glass Polishing Machines , 1927 .
[22] Hyunseop Lee,et al. Mechanical aspects of the chemical mechanical polishing process: A review , 2016 .
[23] Pei-Lum Tso,et al. A study of carrier motion on a dual-face CMP machine , 2001 .
[24] Rung Ching Chen,et al. An artificial bee colony algorithm for data collection path planning in sparse wireless sensor networks , 2013, International Journal of Machine Learning and Cybernetics.
[25] Haedo Jeong,et al. A study on polishing of molds using hydrophilic fixed abrasive pad , 2004 .
[26] Ju Long Yuan,et al. Kinematics and trajectory of both-sides cylindrical lapping process in planetary motion type , 2015 .
[27] Y. Zhu,et al. Basic research on polishing with ice bonded nanoabrasive pad , 2009 .
[28] Emmanuel A. Baisie,et al. Design optimization of diamond disk pad conditioners , 2013 .
[29] K. Ishikawa,et al. Relationships between Contact Image Analysis Results for Pad Surface Texture and Removal Rate in CMP , 2011 .
[30] Yongyong He,et al. Kinematic Optimization for Chemical Mechanical Polishing Based On Statistical Analysis of Particle Trajectories , 2013, IEEE Transactions on Semiconductor Manufacturing.