Novel NiGe MSM Photodetector Featuring Asymmetrical Schottky Barriers Using Sulfur Co-Implantation and Segregation
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[1] N. Taoka,et al. Modulation of NiGe∕Ge Schottky barrier height by sulfur segregation during Ni germanidation , 2006 .
[2] Guo-Qiang Lo,et al. High-Performance Waveguided Ge-on-SOI Metal–Semiconductor–Metal Photodetectors With Novel Silicon–Carbon (Si : C) Schottky Barrier Enhancement Layer , 2008, IEEE Photonics Technology Letters.
[3] J. Wang,et al. Dark-Current Suppression in Metal–Germanium–Metal Photodetectors Through Dopant-Segregation in NiGe—Schottky Barrier , 2008, IEEE Electron Device Letters.
[4] Li-Hong Laih,et al. Characteristics of MSM photodetectors with trench electrodes on p-type Si wafer , 1998 .
[5] Dim-Lee Kwong,et al. Ultrathin low temperature SiGe buffer for the growth of high quality Ge epilayer on Si(100) by ultrahigh vacuum chemical vapor deposition , 2007 .
[6] S. M. Sze,et al. Physics of semiconductor devices , 1969 .
[7] X. Le Roux,et al. Germanium photodetector integrated in a Silicon-On-Insulator microwaveguide , 2007, 2007 4th IEEE International Conference on Group IV Photonics.
[8] S. Koester,et al. Temperature-Dependent Analysis of Ge-on-SOI Photodetectors and Receivers , 2006, 3rd IEEE International Conference on Group IV Photonics, 2006..
[9] Joe C. Campbell,et al. Metal-germanium-metal photodetectors on heteroepitaxial Ge-on-Si with amorphous Ge Schottky barrier enhancement layers , 2003, The 16th Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2003. LEOS 2003..