Incidence angle distributions of ions bombarding grounded surfaces in high density plasma reactors
暂无分享,去创建一个
[1] Sang M. Han,et al. Study of surface reactions during plasma enhanced chemical vapor deposition of SiO2 from SiH4, O2, and Ar plasma , 1996 .
[2] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing , 1994 .
[3] D. Graves,et al. Transport and heating of small particles in high density plasma sources , 1994 .
[4] D. Graves,et al. Neutral transport in high plasma-density reactors , 1994 .
[5] T. C. Lee,et al. Limits to ion energy control in high density glow discharges: Measurement of absolute metastable ion concentrations , 1993 .
[6] E. Aydil,et al. Control of an unstable electron cyclotron resonance plasma , 1993 .
[7] J. Perrin,et al. Retarding‐field analyzer for measurements of ion energy distributions and secondary electron emission coefficients in low‐pressure radio frequency discharges , 1993 .
[8] J. Janes,et al. Energy resolved angular distribution of argon ions at the substrate plane of a radio frequency plasma reactor , 1992 .
[9] R. Gottscho,et al. Metastable chlorine ion transport in a diverging field electron cyclotron resonance plasma , 1992 .
[10] C. W. Jurgensen,et al. Microscopic uniformity in plasma etching , 1992 .
[11] J. Janes,et al. Energy‐resolved angular distributions of O+ ions at the radio‐frequency‐powered electrode in reactive ion etching , 1992 .
[12] J. Janes,et al. Bombardment energies of O2+ in low pressure reactive ion etching , 1992 .
[13] Richard A. Gottscho,et al. Ion transport in an electron cyclotron resonance plasma , 1991 .
[14] Richard A. Gottscho,et al. Ion and neutral temperatures in electron cyclotron resonance plasma reactors , 1991 .
[15] S. Radelaar,et al. Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher , 1991 .
[16] Herbert H. Sawin,et al. Ion bombardment in rf plasmas , 1990 .
[17] R. Gottscho,et al. Spatially resolved ion velocity distributions in a diverging field electron cyclotron resonance plasma reactor , 1990 .
[18] E. A. Hartog,et al. Laser‐induced fluorescence measurements of transverse ion temperature in an electron cyclotron resonance plasma , 1990 .
[19] J. Coburn. Mass spectrometric studies of positive ions in r.f. glow discharges , 1989 .
[20] S. Ingram,et al. Ion and electron energy analysis at a surface in an RF discharge , 1988 .
[21] D. J. Economou,et al. A time-average model of the RF plasma sheath , 1988 .
[22] H. Sawin,et al. Ion bombardment energy distributions in radio‐frequency glow‐discharge systems , 1986 .
[23] W Steckelmacher,et al. Physics of thin films , 1979 .
[24] J. Coburn,et al. Positive‐ion bombardment of substrates in rf diode glow discharge sputtering , 1972 .
[25] J. Coburn. A System for Determining the Mass and Energy of Particles Incident on a Substrate in a Planar Diode Sputtering System , 1970 .
[26] D. Gerstenberg,et al. Physics of Thin Films , 1964 .