Examination of the ambient effects on the stability of amorphous indium-gallium-zinc oxide thin film transistors using a laser-glass-sealing technology

The effect of an ambient atmosphere with a positive bias constant current stress (CCS) and a negative bias illumination stress (NBIS) on the stability of amorphous In-Ga-Zn-O thin film transistors (TFTs) is examined by utilizing a glass-hermetic-sealant with a moisture permeability of less than 10−6 g/m2 · day. In the CCS test, the threshold voltage shift (ΔVth) was remarkably suppressed in the glass-sealed TFTs. The unsealed and resin-sealed TFTs exhibited large ΔVth values. During the NBIS tests, the glass-sealed TFTs had almost the same negative ΔVth as the unsealed and resin sealed TFTs. Among the different TFTs, no significant differences were observed in the threshold voltage, the subthreshold swing and the saturation mobility as a function of the photon energy. It is concluded that ambient molecules were the primary origin of the instability of the ΔVth, induced by a CCS, but they were not related to the NBIS instability. The major role of the effective passivation layers in the NBIS test was not t...

[1]  Jin-seong Park,et al.  Overview of electroceramic materials for oxide semiconductor thin film transistors , 2014, Journal of Electroceramics.

[2]  Jae Kyeong Jeong Photo-bias instability of metal oxide thin film transistors for advanced active matrix displays , 2013 .

[3]  T. Kamiya,et al.  Highly stable amorphous In-Ga-Zn-O thin-film transistors produced by eliminating deep subgap defects , 2011 .

[4]  T. Kamiya,et al.  Depth analysis of subgap electronic states in amorphous oxide semiconductor, a-In-Ga-Zn-O, studied by hard x-ray photoelectron spectroscopy , 2011 .

[5]  Sung-Min Yoon,et al.  Photon-accelerated negative bias instability involving subgap states creation in amorphous In–Ga–Zn–O thin film transistor , 2010 .

[6]  Sangyoon Lee,et al.  The Effect of Passivation Layers on the Negative Bias Instability of Ga-In-Zn-O Thin Film Transistors under Illumination , 2010 .

[7]  Pedro Barquinha,et al.  Insight on the SU-8 resist as passivation layer for transparent Ga2O3–In2O3–ZnO thin-film transistors , 2010 .

[8]  J F Conley,et al.  Instabilities in Amorphous Oxide Semiconductor Thin-Film Transistors , 2010, IEEE Transactions on Device and Materials Reliability.

[9]  Jin Jang,et al.  Improvement in the photon-induced bias stability of Al–Sn–Zn–In–O thin film transistors by adopting AlOx passivation layer , 2010 .

[10]  Hideo Hosono,et al.  Origins of threshold voltage shifts in room-temperature deposited and annealed a-In–Ga–Zn–O thin-film transistors , 2009 .

[11]  Tsutomu Tanaka,et al.  Instability of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors under Light Illumination , 2009 .

[12]  Yeon-Gon Mo,et al.  Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors , 2008 .

[13]  Hideo Hosono,et al.  Subgap states in transparent amorphous oxide semiconductor, In–Ga–Zn–O, observed by bulk sensitive x-ray photoelectron spectroscopy , 2008 .

[14]  Hyun-Joong Chung,et al.  Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water , 2008 .

[15]  H. Ohta,et al.  Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors , 2004, Nature.

[16]  E. Fortunato,et al.  Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances , 2012, Advanced materials.