Measurement of sticking probability and sputtering yield of Au by low-energy mass selected ion beams with a quartz crystal microbalance
暂无分享,去创建一个
A measurement system of sticking probability and sputtering yield in the energy range of 0–500 eV has been established with a low-energy mass selected ion beam system. The small change in mass of the substrate material by injected ions can be evaluated with the quartz crystal microbalance (QCM). In this study, sticking probabilities and self-sputtering yields of Au were measured as functions of the injection energy of Au ions.
[1] M. Kiuchi,et al. Fragment Ions of Dimethylsilane Produced by Hot Tungsten Wires , 2006 .
[2] M. Gläser,et al. Accumulation of decelerated gold ions , 2002 .
[3] M. Kiuchi,et al. Measurement of Au Deposition Rates with Low-Energy Mass Separated Ion Beam Deposition Apparatus , 2006 .
[4] A. Wolter,et al. Sputtering Yield Measurements with Low‐Energy Metal Ion Beams , 1969 .