Measurement of sticking probability and sputtering yield of Au by low-energy mass selected ion beams with a quartz crystal microbalance

A measurement system of sticking probability and sputtering yield in the energy range of 0–500 eV has been established with a low-energy mass selected ion beam system. The small change in mass of the substrate material by injected ions can be evaluated with the quartz crystal microbalance (QCM). In this study, sticking probabilities and self-sputtering yields of Au were measured as functions of the injection energy of Au ions.