The Fabrication of High Aspect Ratio THz Metamaterials

Micromachined metamaterials will be required to provide filters and lenses for the next generation of THz imagers and microscopes. As an example of this emerging technology, we demonstrate here how UV-based surface micromachining can be used to fabricate extremely high aspect ratio pillar arrays. These artificial plasmonic materials act as efficient bandpass filters with a relative transmission of up to 97% measured in the pass band.