论文信息 - Ultra-shallow junction formation by excimer laser annealing and low energy (/<1 keV) B implantation: A two-dimensional analysis - 字舞流文

Ultra-shallow junction formation by excimer laser annealing and low energy (/<1 keV) B implantation: A two-dimensional analysis

G. Fortunato | L. Mariucci | G. Mannino | C. Bongiorno | C. Spinella | A. Mittiga | V. Privitera | M. Stanizzi | M. Italia | S. Whelan