An In Situ Grazing Incidence X‐Ray Scattering Study of Block Copolymer Thin Films During Solvent Vapor Annealing
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Xiaodan Gu | Alexander Hexemer | Thomas P. Russell | A. Hexemer | X. Gu | I. Gunkel | T. P. Russell | Weiyin Gu | Weiyin Gu | Ilja Gunkel
[1] M. Morris,et al. Solvent Vapor Annealing of Block Polymer Thin Films , 2013 .
[2] Eunhye Kim,et al. Directed assembly of high molecular weight block copolymers: highly ordered line patterns of perpendicularly oriented lamellae with large periods. , 2013, ACS nano.
[3] R. Grubbs,et al. Self-assembly of symmetric brush diblock copolymers. , 2013, ACS nano.
[4] Xiaodan Gu,et al. High Aspect Ratio Sub‐15 nm Silicon Trenches From Block Copolymer Templates , 2012, Advanced materials.
[5] Xiaodan Gu,et al. High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications , 2012, Advanced materials.
[6] Jonathan E. Seppala,et al. Spatial and orientation control of cylindrical nanostructures in ABA triblock copolymer thin films by raster solvent vapor annealing. , 2012, ACS nano.
[7] Alfredo Alexander-Katz,et al. Morphology control in block copolymer films using mixed solvent vapors. , 2012, ACS nano.
[8] Ruipeng Li,et al. Stepwise Swelling of a Thin Film of Lamellae-Forming Poly(styrene-b-butadiene) in Cyclohexane Vapor , 2012 .
[9] Julie N. L. Albert,et al. Systematic study on the effect of solvent removal rate on the morphology of solvent vapor annealed ABA triblock copolymer thin films. , 2012, ACS nano.
[10] Kim Y. Lee,et al. Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2 , 2011, Advanced materials.
[11] Jae Won Jeong,et al. Highly tunable self-assembled nanostructures from a poly(2-vinylpyridine-b-dimethylsiloxane) block copolymer. , 2011, Nano letters.
[12] Kathryn L Beers,et al. Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device. , 2011, Nano letters.
[13] M. Hillmyer,et al. Nanoporous membranes derived from block copolymers: from drug delivery to water filtration. , 2010, ACS nano.
[14] Xavier Andre,et al. Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An In Situ GISAXS study. , 2010, Macromolecules.
[15] Dorthe Posselt,et al. Structural rearrangements in a lamellar diblock copolymer thin film during treatment with saturated solvent vapor. , 2010, Macromolecules.
[16] Caroline A. Ross,et al. Solvent‐Vapor‐Induced Tunability of Self‐Assembled Block Copolymer Patterns , 2009 .
[17] Soojin Park,et al. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order , 2009, Science.
[18] Thomas P. Russell,et al. Controlling Orientation and Order in Block Copolymer Thin Films , 2008 .
[19] Dorthe Posselt,et al. Structural instabilities in lamellar diblock copolymer thin films during solvent vapor uptake. , 2008, Langmuir : the ACS journal of surfaces and colloids.
[20] Erin M. Lennon,et al. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays , 2008, Science.
[21] Joel K. W. Yang,et al. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates , 2008, Science.
[22] Ricardo Ruiz,et al. Control of self-assembly of lithographically patternable block copolymer films. , 2008, ACS nano.
[23] T. Russell,et al. Influence of ionic complexes on phase behavior of polystyrene-b-poly(methyl methacrylate) copolymers , 2008 .
[24] A. Knoll,et al. Time evolution of surface relief structures in thin block copolymer films , 2007 .
[25] Jillian M. Buriak,et al. Assembly of aligned linear metallic patterns on silicon , 2007, Nature Nanotechnology.
[26] Y. Jung,et al. Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer. , 2007, Nano letters.
[27] Kevin A. Cavicchi,et al. Solvent Annealed Thin Films of Asymmetric Polyisoprene−Polylactide Diblock Copolymers , 2007 .
[28] B. Ocko,et al. Salt complexation in block copolymer thin films , 2006 .
[29] Thomas P. Russell,et al. Nanoporous Membranes with Ultrahigh Selectivity and Flux for the Filtration of Viruses , 2006 .
[30] Thomas P. Russell,et al. Solvent annealing thin films of poly (isoprene- b-lactide) , 2005 .
[31] A. Knoll,et al. Direct imaging and mesoscale modelling of phase transitions in a nanostructured fluid , 2004, Nature materials.
[32] Ting Xu,et al. Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation , 2004 .
[33] P. Nealey,et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates , 2003, Nature.
[34] T. Lodge,et al. Phase behavior of block copolymers in a neutral solvent , 2003 .
[35] Henry I. Smith,et al. Fabrication of nanostructures with long-range order using block copolymer lithography , 2002 .
[36] Zhiqun Lin,et al. A Rapid Route to Arrays of Nanostructures in Thin Films , 2002 .
[37] D. Smilgies,et al. Characterization of polymer thin films with small‐angle X‐ray scattering under grazing incidence (GISAXS) , 2002 .
[38] A. Knoll,et al. Phase behavior in thin films of cylinder-forming block copolymers. , 2002, Physical review letters.
[39] W. Russel,et al. Scaling of Domain Spacing in Concentrated Solutions of Block Copolymers in Selective Solvents , 2002 .
[40] E. Kramer,et al. Graphoepitaxy of Spherical Domain Block Copolymer Films , 2001 .
[41] Joy Cheng,et al. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography , 2001 .
[42] T. Hashimoto,et al. Order–disorder transition of polystyrene-block-polyisoprene Part II. Characteristic length as a function of polymer concentration, molecular weight, copolymer composition, and χ parameter , 2001 .
[43] K. Guarini,et al. Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates. , 2000, Science.
[44] C. Stafford,et al. Expansion of Polystyrene Using Supercritical Carbon Dioxide: Effects of Molecular Weight, Polydispersity, and Low Molecular Weight Components , 1999 .
[45] Matthew Libera,et al. Morphological Development in Solvent-Cast Polystyrene−Polybutadiene−Polystyrene (SBS) Triblock Copolymer Thin Films , 1998 .
[46] Christopher Harrison,et al. Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter , 1997 .
[47] T. Hashimoto,et al. Order‐disorder transition of polystyrene‐block‐polyisoprene. I. Thermal concentration fluctuations in single‐phase melts and solutions and determination of χ as a function of molecular weight and composition , 1996 .
[48] F. Bates,et al. Failure of the dilution approximation in block copolymer solutions , 1995 .
[49] K. Shull. Mean-field theory of block copolymers: bulk melts, surfaces, and thin films , 1992 .
[50] H. Kawai,et al. Ordered structure in block polymer solutions. 3. Concentration dependence of microdomains in nonselective solvents , 1983 .
[51] E. Helfand,et al. Theory of the Interface between Immiscible Polymers. II , 1972 .
[52] T. G. Fox,et al. Influence of molecular weight and degree of crosslinking on the specific volume and glass temperature of polymers , 1955 .
[53] Edwin L. Thomas,et al. Solvent swelling of roll-cast triblock copolymer films , 1998 .
[54] E. Kramer,et al. Determining the temperature-dependent Flory interaction parameter for strongly immiscible polymers from block copolymer segregation measurements , 1994 .
[55] M. Kunz,et al. Evolution of Ordering in Thin Films of Symmetric Diblock Copolymers , 1994 .