HSQ resist for replication stamp in polymers
暂无分享,去创建一个
Jari Turunen | Seppo Honkanen | Muhammad Rizwan Saleem | Petri Stenberg | Mohammad Bilal Khan | Zaffar M. Khan
[1] M. B. Khan,et al. Towards athermal organic-inorganic guided mode resonance filters. , 2011, Optics express.
[2] N. Gadegaard,et al. Direct stamp fabrication for NIL and hot embossing using HSQ , 2007 .
[3] E. Dubois,et al. Transformation of hydrogen silsesquioxane properties with RIE plasma treatment for advanced multiple-gate MOSFETs , 2006 .
[4] Stephen Y. Chou,et al. Imprint of sub-25 nm vias and trenches in polymers , 1995 .
[5] I. Adesida,et al. Ultra-dense hydrogen silsesquioxane (HSQ) structures on thin silicon nitride membranes , 2009 .
[6] C. W. Hagen,et al. 10nm lines and spaces written in HSQ, using electron beam lithography , 2007 .
[7] B. Cunningham,et al. A plastic colorimetric resonant optical biosensor for multiparallel detection of label-free biochemical interactions , 2002, Proceedings of IEEE Sensors.
[8] Yasuo Takahashi,et al. Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations , 1998 .
[9] T. Jaaskelainen,et al. Replication of sub‐micron features using amorphous thermoplastics , 2002 .
[10] Helmut Schift,et al. Hot embossing in polymers as a direct way to pattern resist , 1998 .
[11] Kenji Yamazaki,et al. Influence of edge roughness in resist patterns on etched patterns , 1998 .
[12] Jean Qiu,et al. A plastic colorimetric resonant optical biosensor for multiparallel detection of label-free biochemical interactions , 2002 .
[13] W. Cho,et al. Electron beam lithography patterning of sub-10 nm line using hydrogen silsesquioxane for nanoscale device applications , 2005 .