Hole generation by icosahedral B12 in high‐dose boron as‐implanted silicon
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Miyoko O. Watanabe | A. Murakoshi | M. Yoshiki | I. Mizushima | M. Kashiwagi | M. Hotta | M. Watanabe
暂无分享,去创建一个
Miyoko O. Watanabe | A. Murakoshi | M. Yoshiki | I. Mizushima | M. Kashiwagi | M. Hotta | M. Watanabe