Growth by liquid-injection MOCVD and properties of HfO2 films for microelectronic applications
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F. Ducroquet | C. Millon | V. Cosnier | N. Rochat | S. Rushworth | C. Dubourdieu | E. Rauwel | P. Chaudouët
暂无分享,去创建一个
F. Ducroquet | C. Millon | V. Cosnier | N. Rochat | S. Rushworth | C. Dubourdieu | E. Rauwel | P. Chaudouët