Utilization of gas permeable metal plate for the purpose of reduction of transfer defect in MEMS electronic device

The electronic substrate used for the MEMS device is finely processed, and imprint lithography is often used as a processing method. However, in the printing process, gas is caught in the molding material, and transfer failure frequently occurs. Therefore, in this study, a gas permeable metal plate with a gas permeable structure inside was fabricated and imprinted on a material to be transferred containing 50% of volatile material. As a result, no gas pool was observed and imprinting was possible without defective transfer. This not only prevents entrainment of gas at the time of imprinting, but also a transfer material containing a volatile solvent can be used as a material to be transferred. It is greatly expected that the developed gas permeable metal plate becomes a material necessary for MEMS device processing.

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