论文信息 - Photomask technique for fabricating high purity germanium strip detectors

Photomask technique for fabricating high purity germanium strip detectors

Abstract A new technology for germanium strip detectors has been developed. This technique uses a photomask process which needs no growing and etching and allows all kinds of segmented electrodes. Typically we have obtained 1.2 keV FWHM on the 122 keV line of 57 Co with a X − Y detector having 20 strips on each side.

D. Gutknecht | D. Gutknecht

[1] W. Collis,et al. A Practical Gamma-Ray Camera System Using High-Purity Germanium , 1974 .

[2] P. Luke. Gold-Mask Technique for Fabricating Segmented-Electrode Germanium Detectors , 1984, IEEE Transactions on Nuclear Science.

[3] J. Detko. Semiconductor diode matrix for isotope localization. , 1969, Physics in medicine and biology.

[4] L. Kaufman,et al. Imaging with a Small Ultra Pure Germanium Gamma-Camera , 1975, IEEE Transactions on Nuclear Science.

[5] M. Budinich,et al. A Monolithic Germanium Target with 100 Microns Granularity for Life-Time Measurement of Charmed Particles , 1983, IEEE Transactions on Nuclear Science.

[6] F. Bedeschi,et al. Germanium microstrip detectors with 50 and 100 μm pitch , 1984 .