论文信息 - Effect of a Two-Step Recess Process Using Atomic Layer Etching on the Performance of $\hbox{In}_{0.52}\hbox{Al}_{0.48}\hbox{As/In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ p-HEMTs - 字舞流文

Effect of a Two-Step Recess Process Using Atomic Layer Etching on the Performance of $\hbox{In}_{0.52}\hbox{Al}_{0.48}\hbox{As/In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ p-HEMTs

Daehyun Kim | J. Rhee | Tae-Woo Kim | Jae‐Hyung Jang | Jong-In Song | S. Duk | Geun Young | Byeong Lim Ok