Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 um

The fabrication and characterization of UV-light-imprinted solgel silica glass waveguides on glass and silicon substrates are described. Waveguide fabrication parameters are evaluated. Appropriate combinations of UV light exposure time, sol-gel film thickness, and postbake time produce waveguides suitable for use at a 1.55-?m wavelength. Propagation losses in these waveguides are less than 0.3 dB/cm.