Line end shortening in CPL mask technology
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Will Conley | Robert John Socha | Chris Progler | Kevin Lucas | Bryan S. Kasprowicz | Wei Wu | Pat Cook | Thomas Laidig | Kurt E. Wampler | Lloyd C. Litt | Arjan Verhappen | Erika Schaefer | Jan Pieter Kuijten | Doug Van Den Broeke | Stephen Hsu | Bernie Roman | Stefan van de Goor
[1] Hiroaki Morimoto,et al. Feasibility study of an embedded transparent phase-shifting mask in ArF lithography , 2000, Advanced Lithography.