Optimizing the growth of vertically stacked InP/In/sub 0.5/Al/sub 0.3/Ga/sub 0.2/P quantum dots by metalorganic chemical vapor deposition
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R. D. Heller | N. Holonyak | R. Dupuis | G. Walter | Xiaohong Zhang | X.B. Zhang | M. Noh | R. Heller