The Italian FIRB project on EUV lithography

The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the realization of a micro-exposure-tool and the up-grading of the National knowledge on EUV-lithography in all its aspects, from plasma sources (both high power sources and auxiliary sources for tests), debris mitigation, multilayer mirrors, and masks. The micro-exposure-tool, which is under development, will be operated at a wavelength slightly different from the international standard of 13.5 nm in order to allow the use of an innovative debris mitigation system. A novel application of EUVL to photonics is also reported.