Physical model for the laser induced forward transfer process

This paper presents a numerical model which describes the underlying physical processes during laser induced forward transfer. The laser induced forward transfer uses a pulsed laser to transfer thin layers from a transparent support to a substrate. The model predicts the threshold energies Eth as well as the blow-off time tblow, thus allowing a profound physical understanding of the transfer process. The good agreement of simulated with measured Eth and tblow of thin nickel layers demonstrates the accuracy of the model. The model shows that gasification of the soda-lime glass support is the main driving force of the transfer process.This paper presents a numerical model which describes the underlying physical processes during laser induced forward transfer. The laser induced forward transfer uses a pulsed laser to transfer thin layers from a transparent support to a substrate. The model predicts the threshold energies Eth as well as the blow-off time tblow, thus allowing a profound physical understanding of the transfer process. The good agreement of simulated with measured Eth and tblow of thin nickel layers demonstrates the accuracy of the model. The model shows that gasification of the soda-lime glass support is the main driving force of the transfer process.

[1]  A. Clare,et al.  Differences between surface and bulk properties of glass melts I. Compositional differences and influence of volatilization on composition and other physical properties , 2000 .

[2]  V. Schultze,et al.  Laser-induced forward transfer of aluminium , 1991 .

[3]  W. M. Haynes CRC Handbook of Chemistry and Physics , 1990 .

[4]  M. Tomozawa,et al.  Fictive temperature dependence of subcritical crack growth rate of normal glass and anomalous glass , 2006 .

[5]  V. Veiko,et al.  Laser–induced film deposition by LIFT: Physical mechanisms and applications , 2006 .

[6]  P. D. Desai Thermodynamic properties of nickel , 1987 .

[7]  V. Schultze,et al.  Blow-off of aluminium films , 1991 .

[8]  Tamás Szörényi,et al.  Deposition of micrometer-sized tungsten patterns by laser transfer technique , 1994 .

[9]  R. W. Christy,et al.  Optical constants of transition metals: Ti, V, Cr, Mn, Fe, Co, Ni, and Pd , 1974 .

[10]  Tamás Szörényi,et al.  Laser induced forward transfer: The effect of support-film interface and film-to-substrate distance on transfer , 1992 .

[11]  Nan M. Froberg,et al.  Minimum fluence for laser blow‐off of thin gold films at 248 and 532 nm , 1990 .

[12]  Earl A. Gulbransen,et al.  The high-temperature oxidation, reduction, and volatilization reactions of silicon and silicon carbide , 1972 .

[13]  C. R. Brooks,et al.  Physical contributions to the heat capacity of nickel , 1981 .

[14]  T. J. Connolly,et al.  THERMAL CONDUCTIVITY OF CLEAR FUSED SILICA AT HIGH TEMPERATURES. Research Report 44 , 1959 .

[15]  Narottam P. Bansal,et al.  Chapter 10 – Elastic Properties , 1986 .

[16]  S. Krishnan,et al.  OPTICAL PROPERTIES OF LIQUID NICKEL AND IRON , 1997 .

[17]  Harold L. Schick,et al.  A Thermodynamic Analysis of the High-temperature Vaporization Properties of Silica. , 1960 .

[18]  F. J. Adrian,et al.  Metal deposition from a supported metal film using an excimer laser , 1986 .

[19]  A. N. Jette,et al.  A study of the mechanism of metal deposition by the laser-induced forward transfer process , 1987 .

[20]  Heng Pan,et al.  Nanomaterial enabled laser transfer for organic light emitting material direct writing , 2008 .

[21]  Philippe Delaporte,et al.  Pulsed-laser printing of organic thin-film transistors , 2009 .

[22]  Frank Nüesch,et al.  Fabrication of organic light-emitting diode pixels by laser-assisted forward transfer , 2007 .