Photodissociation of multilayered trimethylaluminum adsorbed on a cryogenic substrate: A time‐of‐flight mass‐spectrometric study

Photodissociation of trimethylaluminum [Al(CH3)3] adsorbed on a silica (SiO2) substrate at 110 K has been studied by multiphoton ionization time-of-flight mass spectrometry. Translational energy distributions of aluminum and AlCH3 fragments can be fitted with a composition of two Maxwell–Boltzmann distributions. The two components are attributed to different environments of photodissociating parent molecules in the multilayer.

[1]  G. Higashi.  Subthermal photoproduct surface desorption distributions arising from excimer laser excitation of adsorbed trimethylaluminum , 1988 .

[2]  A. Laubengayer,et al.  The Alkyls of the Third Group Elements. I. Vapor Phase Studies of the Alkyls of Aluminum, Gallium and Indium1 , 1941 .

[3]  Yuanjian Zhang,et al.  Laser mass spectrometric detection of AlH molecules as collision-free excimer laser photoproducts from aluminum alkyls , 1988 .

[4]  Hiroyasu Sato.  Organometallic chemistry related to applications for microelectronics in Japan , 1991 .

[5]  T. Motooka,et al.  UV‐laser photolysis of trimethylaluminum for Al film growth , 1985 .

[6]  M. Stuke,et al.  UV excimer laser photochemistry of gaseous and surface adsorbed organometallics , 1988 .

[7]  C. Callender,et al.  The translational energy distributions for metal atoms and ions produced via visible laser MPD/MPI of group 13 metal alkyls and MPI of aluminum and indium atomic beams , 1988 .

[8]  A. E. Vries,et al.  A time‐of‐flight study of the neutral species produced by nanosecond laser etching of CuCl at 308 nm , 1986 .

[9]  M. Stuke,et al.  Tunable UV laser photolysis of organometallics with product detection by laser mass spectroscopy: Trimethylaluminum , 1989 .

[10]  T. Motooka,et al.  Mechanisms of Al film growth by ultraviolet laser photolysis of trimethylaluminum , 1986 .

[11]  P. Hackett,et al.  Pulsed visible laser photolyis of B(C2H5)3, Al2(CH3)6, Ga(CH3)3, and In(CH3)3: Multiphoton ionization spectra of Al, Ga, and In atoms , 1983 .

[12]  D. A. Mantell,et al.  Aluminum deposition by ultraviolet laser photofragmentation of trimethylaluminum on Al: Identification of photoproducts and desorption dynamics , 1989 .

[13]  M. Stuke,et al.  Photolysis of group III (Al, Ga, In) trimethyl compounds: Detection of organic photofragments CH3 and C2H6 by picosecond laser mass spectroscopy , 1991 .

[14]  R. M. Osgood,et al.  Laser Microchemistry and its Application to Electron-Device Fabrication , 1983 .